Sputtering Target Material for Semiconductor Market, Global Outlook and Forecast 2023-2030
- Siddhi Patil
- Sep 6, 2023
- 2 min read
Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market. This report aims to provide a comprehensive presentation of the global market for Sputtering Target Material for Semiconductor, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Sputtering Target Material for Semiconductor. This report contains market size and forecasts of Sputtering Target Material for Semiconductor in global, including the following market information: Global Sputtering Target Material for Semiconductor Market Revenue, 2018-2023, 2024-2030, ($ millions) Global Sputtering Target Material for Semiconductor Market Sales, 2018-2023, 2024-2030, (MT) Global top five Sputtering Target Material for Semiconductor companies in 2022 (%) The global Sputtering Target Material for Semiconductor market was valued at US$ 1678.9 million in 2022 and is projected to reach US$ 2419.6 million by 2029, at a CAGR of 5.4% during the forecast period. The influence of COVID-19 and the Russia-Ukraine War were considered while estimating market sizes. Global Sputtering Target Material key players include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting etc. Global top five manufacturers hold a share over 43%. North America is the largest market,
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